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CVD
Chemical Vapour Deposition, coating process involving the deposition of a layer by decomposition of a gaseous compound (e. g. deposition of a metal by thermal decomposition of a volatile compound of the metal). CVD processes can be supported (PECVD = Plasma Enhanced CVD) or started (PACVD = Plasma Activated CVD) by plasma. Important applications of CVD processes are layers of amorphous carbon or silicon as well as titanium nitride, titanium carbide and silicon nitride layers.
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